ANGULAR SELECTIVITY OF THE INFRARED TRANSMITTANCE THROUGH OBLIQUELY SPUTTER-DEPOSITED TI-OXIDE-BASED FILMS

Citation
D. Lebellac et al., ANGULAR SELECTIVITY OF THE INFRARED TRANSMITTANCE THROUGH OBLIQUELY SPUTTER-DEPOSITED TI-OXIDE-BASED FILMS, Thin solid films, 266(2), 1995, pp. 94-95
Citations number
13
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
266
Issue
2
Year of publication
1995
Pages
94 - 95
Database
ISI
SICI code
0040-6090(1995)266:2<94:ASOTIT>2.0.ZU;2-R
Abstract
Titanium-oxide-based films were produced by reactive sputtering onto g lass substrates oriented with a large angle between the surface normal and the direction of the incoming deposition species. The optical pro perties were angular selective with a higher transmittance for light i ncident from the same side of the normal (positive angles) as the depo sition material than for light coming from negative angles. The select ivity was largest in the near-infrared wavelength range.