Preparation conditions of device-quality CuInSe2 (CIS) and CuIn1-xGaxS
e2 (CIGS) thin films were studied. We formed CIS and CIGS films by ann
ealing different types of precursor films, such as Gu/In stacked films
and Cu-In-Se co-deposited films, under H2Se atmosphere. We obtained C
I(G)S films with large grain size using precursors prepared at 200-deg
rees-C. The grain sizes of CI(G)S film using stacked precursors were l
arger than those using co-deposited precursors. Use of co-deposited pr
ecursors reduced formation of MoSe2 at Mo/CI(G)S boundary during selen
ization process. Fill-factor (FF) exceeding 0.7 was obtained for CIS c
ells using co-deposited precursors prepared at substrate temperature o
f 200-degrees-C.