Gp. Pells et Er. Hodgson, OPTICAL AND ELECTRON-MICROSCOPY OF SAPPHIRE IRRADIATED WITH AN APPLIED ELECTRIC-FIELD AT 450-CENTER-DOT-C, Journal of nuclear materials, 226(3), 1995, pp. 286-292
Citations number
16
Categorie Soggetti
Nuclear Sciences & Tecnology","Mining & Mineral Processing","Material Science
Single crystal alpha-alumina (sapphire) has been irradiated with 1.8 M
eV electrons at a temperature of 450 degrees C while subject to an ele
ctric field of 130 kV/m. At intervals during the course of the irradia
tion the electron beam was switched off and the electrical conductivit
y of the sapphire was measured at 450 degrees C. After a damage dose o
f similar to 10(-7) dpa the intrinsic electrical conductivity began to
rise, increasing by four orders of magnitude after only 8 x 10(-6) dp
a. The combination of displacement damage, electric field and temperat
ure leading to increased electrical conductivity is known as the RIED
effect (Radiation-Induced Electrical Degradation). Optical microscopy
of the irradiated sapphire revealed thin disc shaped precipitates but
only in the irradiated area of the sample subject to an electric field
. TEM of the irradiated area showed that the precipitates consisted of
an intimate mixture of alpha- and gamma-alumina with (<000(6)over bar
> sapphire//((1) over bar (1) over bar 1) gamma-)alumina and (01(1) ov
er bar 2) sapphire//(311) gamma-alumina. The relative orientations of
alpha- and gamma-alumina show that a phase change is involved which ha
s not been previously observed in bulk irradiated alumina.