PREPARATION OF AS-DEPOSITED 80 K-PHASE BI-SR-CA-CU-O FILMS BY RF MAGNETRON SPUTTERING

We prepared the as-deposited 80 K-phase Bi-Sr-Ca-Cu-0 (BSCCO) films us ing the rf magnetron sputtering method with a single target. When the substrates were set at the position parallel to the target, the as-dep osited 80 K-phase BSCCO films with the zero-resistance temperature of 65 K were prepared at the substrate temperatures from 630 to 650-degre es-C under the total gas pressure of 200 mTorr, where the ratio of oxy gen to total gas pressure was from 75 to 100%. The regions of substrat e temperature and total gas pressure for obtaining the 80 K-phase BSCC O film were extended by setting the substrate at the position perpendi cular to the target.