D. Papajova et al., A STUDY OF A KINETIC RATE-EQUATION MODEL FOR SIMULATIONS OF MBE CRYSTAL-GROWTH - A COMPARISON WITH MONTE-CARLO SIMULATIONS, Thin solid films, 267(1-2), 1995, pp. 47-50
We present the simulations of molecular beam epitaxy (MBE) growth usin
g a rate equation (RE) model and its comparison with Monte-Carlo (MC)
simulations. The advantage of the RE model is the higher speed of calc
ulations, so a much shorter time is required for obtaining results, Th
e RE model is described by a set of differential equations that calcul
ate at each time interval the change of the N-kj numbers of atoms and
islands of each k size in each jth layer. This change is due to kineti
c processes occurring on the surface during the growth. In the origina
l model (R. Kariotis and H.G. Lagally, Surf Sci., 216 (1989) 557) the
probabilities of these processes were described by parameters (input p
arameters for equations) and the simulations of MBE growth were realiz
ed by an appropriate choice of them. To make this model applicable to
real simulations, we have included the substrate-temperature dependenc
e of all input parameters using an Arrhenius form, This form is used i
n MC simulations to calculate a migration of atoms on the surface with
substrate-temperature dependence. Since the RE model is described by
a set of differential equations it was important to first find the all
owed temperature range for simulations. This range includes the substr
ate temperature for the 3D growth mode (low temperatures) and also for
the 2D growth mode (epitaxial temperatures). Using an Arrhenius form
for temperature dependence of the parameters in the RE model we were a
ble to compare the obtained results with MC calculations. We have made
MC simulations (S, Nemeth, R. Harman and M. Vesely;, Correlation betw
een the stochastic simulation of molecular beam epitaxy growth and exp
eriment, 9th Int. Conf. of Thin Films, 6-10 September, 1993, Vienna, A
ustria) using the same input parameters (T = 775 K, E(n) = 0.3 eV, E(s
) = 1.45 eV). Since the RE model is strongly substrate-size dependent
(D. Papajova, W.E. Hagston and P. Harrison, Appl. Phys. A, 59 (1994) 2
15-222; D. Papajova, S. Nemeth, W.E Hagston, H. Sitter and M. Vesely,
J.Appl. Phys. A, submitted) we have found very good agreement in 2D gr
owth for smaller substrate sizes S (in the RE model) only, when this d
ependence does not influence the results.