EPITAXIAL METAL SILICIDES - INTERFACE MAPPING BY SCANNING PROBE TECHNIQUES

Citation
H. Vonkanel et al., EPITAXIAL METAL SILICIDES - INTERFACE MAPPING BY SCANNING PROBE TECHNIQUES, Thin solid films, 267(1-2), 1995, pp. 89-94
Citations number
24
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
267
Issue
1-2
Year of publication
1995
Pages
89 - 94
Database
ISI
SICI code
0040-6090(1995)267:1-2<89:EMS-IM>2.0.ZU;2-U
Abstract
The defect structures at epitaxial CoSi2 interfaces were imaged by mea ns of scanning tunneling microscopy, scanning tunneling spectroscopy ( STS), modulation spectroscopy (MS), and ballistic electron-emission mi croscopy (BEEM). Interfacial dislocations and point defects in thin fi lms give rise to significant contrast in BEEM images. The lateral vari ations of the film thickness can be determined with monolayer precisio n by making use of the quantum size effect in STS or MS, and of the in elastic hot electron scattering within CoSi2 in BEEM.