THERMAL CHARACTERIZATION OF THERMALLY-SHUNTED HETEROJUNCTION BIPOLAR-TRANSISTORS

Citation
J. Sewell et al., THERMAL CHARACTERIZATION OF THERMALLY-SHUNTED HETEROJUNCTION BIPOLAR-TRANSISTORS, IEEE electron device letters, 17(1), 1996, pp. 19-21
Citations number
12
Categorie Soggetti
Engineering, Eletrical & Electronic
ISSN journal
07413106
Volume
17
Issue
1
Year of publication
1996
Pages
19 - 21
Database
ISI
SICI code
0741-3106(1996)17:1<19:TCOTHB>2.0.ZU;2-7
Abstract
Heterojunction Bipolar Transistors (HBT's) are potentially useful in a number of microwave applications, but they are severely limited by a current distribution instability caused by electrothermal interaction and the use of a low thermal conductivity substrate. A novel thermal m anagement technique called ''thermal shunting'' has been developed to reduce thermal resistance and junction temperature non-uniformity. The rmal resistance measurements for thermally-shunted devices are present ed. Specific thermal resistance measurements as low as 2.6 x 10(-4) de grees C-cm(2)/W (147 degrees C/W at 0.1 W for a device with a 177 mu m (2) emitter area) have been obtained. Thermal resistance values obtain ed for thermally-shunted HBT's are substantially lower than those repo rted for conventional HBT's.