COMPLEX XRD MICROSTRUCTURAL STUDIES OF HARD COATINGS APPLIED TO PVD-DEPOSITED TIN FILMS .2. TRANSITION FROM POROUS TO COMPACT FILMS AND MICROSTRUCTURAL INHOMOGENEITY OF THE LAYERS

Citation
R. Kuzel et al., COMPLEX XRD MICROSTRUCTURAL STUDIES OF HARD COATINGS APPLIED TO PVD-DEPOSITED TIN FILMS .2. TRANSITION FROM POROUS TO COMPACT FILMS AND MICROSTRUCTURAL INHOMOGENEITY OF THE LAYERS, Thin solid films, 268(1-2), 1995, pp. 72-82
Citations number
10
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
268
Issue
1-2
Year of publication
1995
Pages
72 - 82
Database
ISI
SICI code
0040-6090(1995)268:1-2<72:CXMSOH>2.0.ZU;2-8
Abstract
Transition from porous to compact microstructure of magnetron deposite d TiN films with increasing energy of incoming particles is associated with the changes of stress and strain. This is studied by conventiona l powder diffractometry in Bragg-Brentano geometry, by asymmetric diff raction used for stress measurement in the so-called Omega-and psi-gon iometer geometries and by the Seemann-Bohlin diffractometry. The chang es of lattice parameters and preferred orientation are investigated as well. The results are discussed from several points of view: elastici ty theory, lattice defects and heterogeneous microstructure of the fil ms. The heterogeneity seems to be an important reason for specific eff ects of lattice parameters and X-ray diffraction line broadening aniso tropy. The crystallite group method (CGM) is used for the evaluation o f stress and crystallite size and reveals the microstructural inhomoge neity. The importance of the orientation of crystallite with respect t o the surface for its real structure is further confirmed by the measu rement on freestanding film.