DEPOSITION OF ORGANIC-INORGANIC COMPOSITE THIN-FILMS BY LI3PO4, SPUTTERING AND C2H4, PLASMA POLYMERIZATION

Citation
Bs. Kwak et al., DEPOSITION OF ORGANIC-INORGANIC COMPOSITE THIN-FILMS BY LI3PO4, SPUTTERING AND C2H4, PLASMA POLYMERIZATION, Thin solid films, 269(1-2), 1995, pp. 6-13
Citations number
11
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
269
Issue
1-2
Year of publication
1995
Pages
6 - 13
Database
ISI
SICI code
0040-6090(1995)269:1-2<6:DOOCTB>2.0.ZU;2-D
Abstract
Organic-inorganic composite macromolecular thin films have been grown by combined r.f.-magnetron sputtering of lithium orthophosphate (Li3PO 4) and plasma polymerization of ethylene (C2H4). Of the process gases used, Ar, N-2, Ar/N-2, and Ar/O-2, only the Ar/O-2 mixture provided su itable control over the co-deposition process. The structure and elect rical properties of the smooth, pinhole-free films were investigated b y X-ray photoelectron spectroscopy, scanning electron microscopy, Four ier transform infrared spectroscopy, Rutherford backscattering spectro scopy, X-ray diffraction, and a.c.-impedance measurement. The inorgani c component of the composite films was found to exist both as a separa te phase and as a part of the polymeric backbone. The ionic conductivi ty was found to decrease with the organic content of the film.