INDIRECT TUNNELING IN METAL-INSULATOR-METAL JUNCTIONS

Citation
V. Fleurov et al., INDIRECT TUNNELING IN METAL-INSULATOR-METAL JUNCTIONS, Solid state communications, 97(6), 1996, pp. 543-547
Citations number
25
Categorie Soggetti
Physics, Condensed Matter
Journal title
ISSN journal
00381098
Volume
97
Issue
6
Year of publication
1996
Pages
543 - 547
Database
ISI
SICI code
0038-1098(1996)97:6<543:ITIMJ>2.0.ZU;2-6
Abstract
I-V characteristics of realistic MIM junctions were calculated assumin g a two step indirect tunneling as the major mechanism. Electron-phono n broadening of the energy level of the intermediate defect states is taken into account. The theory is compared with our experimental inves tigations of Pd-MgO-Pd junctions and good quantitative agreement is ac hieved. The intermediate states are provided by the F-centers of the M gO vacancies. A consistency between the experimental data and the theo ry is obtained for the values of the physical parameters known from in dependent studies on MgO.