Yttria-stabilized zirconia (YSZ) films were synthesized using reactive
d.c, magnetron sputter deposition. A homogeneous alloy of Zr-Y was sy
nthesized and processed into a planar magnetron target which is reacti
vely sputtered with an argon-oxygen gas mixture to form Zr-Y-O films.
The sputtering conditions of gas flow, gas pressure, deposition rate a
nd substrate temperature were determined in order to produce the cubic
phase of zirconia as verified by X-ray diffraction. A higher rate of
deposition is achievable when the sputtering mode of the Zr-Y alloy ta
rget is metallic as opposed to oxide. The Zr-Y composition of the plan
ar magnetron target was designed for optimum oxygen-ion conductivity i
n the YSZ films, al elevated temperature for potential use in solid-ox
ide fuel cells. The oxygen concentration of the as-deposited films was
measured using Auger electron spectroscopy and found to vary principa
lly as a function of the sputter deposition rate. A fuel cell was prod
uced with the reactive deposition process using Pt electrodes from whi
ch the growth morphology of the YSZ layer was characterized using scan
ning electron microscopy.