Thin films of YBa2Cu3O7 coated with a photoresist have been patterned
by means of XeCl- and KrF-excimer-laser light projection. Lines with w
idths down to 3.5 mum have been fabricated without degradation in T(c)
and j(c). The technique is compared with wet-chemical etching and wit
h ns and fs excimer-laser patterning of films without a protective lay
er.