PHYSICAL AND TRIBOLOGICAL PROPERTIES OF DIAMOND FILMS GROWN IN ARGON-CARBON PLASMAS

Nanocrystalline diamond films have been deposited using a microwave pl asma consisting of argon, 2-10% hydrogen and a carbon precursor such a s C-60 or CH4. it was found that it is possible to grow the diamond ph ase with both carbon precursors, although the hydrogen concentration i n the plasma was 1-2 orders of magnitude lower than normally required in the absence of the argon. Auger electron spectroscopy, X-ray diffra ction measurements and transmission electron microscopy indicate the f ilms are predominantly composed of diamond. Surface roughness, as dete rmined by atomic force microscopy and scanning electron microscopy ind icate the nanocrystalline films grown in low hydrogen content plasmas are exceptionally smooth (30-50 nm rms) to thicknesses of 10 m. The sm ooth nanocrystalline films result in low friction coefficients (mu = 0 .04-0.06) and low average wear rates as determined by bail-on-disk mea surements.