N. Schwarzer et al., THE ANALYTICAL SOLUTION OF THE CONTACT PROBLEM OF SPHERICAL INDENTERSON LAYERED MATERIALS - APPLICATION FOR THE INVESTIGATION OF TIN FILMSON SILICON, Thin solid films, 270(1-2), 1995, pp. 371-375
Utilising an analytical solution of the contact problem of spherical i
ndentation into layered materials we investigated TiN layers of variou
s thicknesses on single-crystal silicon. We used Heaviside functions t
o describe the discontinuity of the mechanical parameters at the inter
face of the TiN-silicon compound. A spherical 5 mu m diamond indenter
was used to obtain the penetration depth-force curves. In spite of thi
s small indenter we only obtained good utilizable results for film thi
cknesses of more than 0.8 mu m. For thinner films the influence of fai
lure effects such as roughness of the film, not an exactly known film
thickness and substrate parameters, deviation of the shape of the diam
ond indenter from the ideal spherical one and the failure caused by th
e indentation apparatus themselves becomes too influential. Thus, here
we show an investigation of a 1.4 and an 0.8 mu m TiN layer on silico
n including calculation of the films Young's modulus and the stresses,
and for an 0.4 and an 0.2 mu m TiN layer on silicon a stress calculat
ion only using estimated Young's moduli from the thicker films. We pai
d special attention to the investigation of the non-elastic behaviour
of the compounds utilising the von-Mises criterion.