SPUTTERING OF CU THIN-FILMS ON RU(0001) BY NE-BOMBARDMENT( ION)

Ion induced desorption cross sections for Cu thin films (less than or equal to 1 ML) on Ru(0001) have been measured by bombardment with Neions. The accurate calibration of the Cu coverage was carried out by A uger electron spectroscopy (AES), low energy electron diffraction (LEE D) and low energy ion scattering (LEIS). Decreases in surface Cu as a function of ion dose were monitored for various Cu coverages by LEIS m easurement. At 1 ML of Cu coverage, the desorption cross section was m easured to be sigma D similar to 2.03 x 10(-15) ions/cm(2), or a sputt ering yield of Y similar to 3.2 at 1 keV. Application of binary collis ion sputtering models indicates that for E(0) > 400 eV the Cu atoms ar e mainly removed by sputtered Ru atoms moving outward through the surf ace region.