SURFACE MODIFICATIONS BY GAS CLUSTER ION-BEAMS

New aspects of surface treatment by gas cluster ion beams are discusse d. Molecular dynamics simulation has shown that a considerably high da mage region is formed at a depth exceeding the mean projected range of the implanted atoms. High yield sputtering has also been shown to occ ur with respect to lateral sputtering. Experiments on shallow implanta tion, high yield sputtering, surface smoothing and low damage surface cleaning were performed. The obtained results are compared with those of conventional monomer ion irradiation. Possible applications of ioni zed cluster beams to a new area of surface modifications are discussed .