SIMULTANEOUS MASS-ANALYZED POSITIVE AND NEGATIVE LOW-ENERGY ION-BEAM DEPOSITION APPARATUS

We have developed a new concept low-energy ion beam deposition apparat us. This machine can generate mass-analyzed very low energy ion beams with positive and negative charges at the same time. It is possible to deposit these ions not only simultaneously but also alternatively. Th e name is Taotron and the nickname is PANDA (Positive And Negative-ion s Deposition Apparatus). The aiming specifications of this apparatus a re: (1) available positive ions are H, B, C, N, O, Si, Fe, etc. and ne gative ions are H, B, C, O, Si etc., (2) ion energy range covers 10 eV to 20 keV, (3) typical ion beam current is greater than or equal to 1 0 mu A (for 10 eV oxygen ions with both charges) and the beam size is greater than or equal to 10 mm empty set, (4) the base pressure of the deposition chamber is in the order of 10(-8) Pa and the pressure duri ng deposition is in the order of 10(-6) Pa.