B. Michelt et al., MEASUREMENT OF THE ROTATIONAL TEMPERATURE OF OXYGEN IN A HIGH-POWER INDUCTIVELY-COUPLED PLASMA, Journal of physics. D, Applied physics, 28(12), 1995, pp. 2600-2606
In a high-power (30 kW), inductively coupled argon-oxygen plasma used
as a tool to deposit high-temperature superconducting YBa2Cu3O7-x film
s rotational bands of the Schumann-Runge system B-3 Sigma(u)-X(3) Sigm
a(g) Of oxygen were detected in the spectral regions around 340 and 36
0 nm. After derivation of the line strength factors for the triplet sy
stem, rotational temperatures can be determined by fitting calculated
relative intensities to those observed experimentally, and the contrib
utions of R and P branches to the lines observed can be identified. Th
e rotational temperature T at a distance of 34.5 cm from the exit of t
he plasma torch where the deposition of superconducting films takes pl
ace lies in the range 1850-2050 K depending on the RF power input whic
h was varied in the range 8-27 kW. Near the torch exit, temperatures i
n the range 2600-3400 K are observed. They depend strongly on gas comp
osition and gas flow rate, in contrast to positions far away from the
torch exit. Excitation temperatures near the torch exit which were der
ived from Ar lines are considerably higher than the rotational tempera
tures, indicating that the latter are typical of the colder outer part
s of the plasma.