N. Cuendet et al., THE ENERGETICS OF (113) STACKING-FAULT FORMATION IN SI FROM SUPERSATURATED INTERSTITIALS, Applied physics letters, 68(1), 1996, pp. 19-21
Using a Tersoff-type empirical potential energy function, the free ene
rgy of formation for {113}-type stacking faults in silicon has been ca
lculated both as a function of stacking fault rod length and width at
a variety of temperatures. A particular tetrahedral-tetrahedral dimer
has the lowest free energy of formation at 0 K and this type of stacki
ng fault forms an assemblage of such dimers. The free energy of format
ion per interstitial in a ribbon fault decreases with ribbon width, ri
bbon length, and increase of temperature. (C) 1996 American Institute
of Physics.