GROWTH AND CHARACTERIZATION OF ALINGAN QUATERNARY ALLOYS

Citation
Fg. Mcintosh et al., GROWTH AND CHARACTERIZATION OF ALINGAN QUATERNARY ALLOYS, Applied physics letters, 68(1), 1996, pp. 40-42
Citations number
8
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
68
Issue
1
Year of publication
1996
Pages
40 - 42
Database
ISI
SICI code
0003-6951(1996)68:1<40:GACOAQ>2.0.ZU;2-7
Abstract
We report on the deposition of Al(y)In(x)Gal(1-x-y)N in the (0<y<0.15) and (0<x<0.14) composition range by metalorganic chemical vapor depos ition. AlInGaN quaternary alloys offer lattice-matched platform for In GaN-based light emitting heterostructure devices. Epitaxial growth of AlInGaN on (0001) sapphire substrates has been achieved at 750 degrees C. Alloy composition, lattice constants, and band gaps were obtained by energy dispersive spectroscopy, x-ray diffraction, and room tempera ture FL. Band edge emissions dominate the PL spectra of these quaterna ry films. Preliminary data suggest that the lattice constant of AlInGa N can be deduced from chemical composition using Vegard's law, indicat ing solid solution in the grown quaternary films. (C) 1996 American In stitute of Physics.