The deflection of bimorphs consisting of thin films of nickel on silic
on substrates has been accurately measured as a function of applied in
-plane magnetic field, using an optical method. Striking differences i
n the magnetoelastic behavior are observed for these systems compared
with bulk nickel, mainly due to the anisotropic behavior of silicon su
bstrates and to large in plane tensile stresses in nickel films, which
favor an easy magnetization axis perpendicular to the film plane: Def
lections measured with the magnetic held parallel and perpendicular to
the length of the bimorph exhibit the same sign, and the ''parallel d
eflection'' is enhanced by a factor 1.3. These are the first experimen
ts demonstrating the validity of a formula recently derived for predic
ting the deflection of magnetostrictive bimorphs. (C) 1996 American In
stitute of Physics.