Jm. Karam et al., COLLECTIVE FABRICATION OF MICROSYSTEMS COMPATIBLE WITH CMOS THROUGH THE CMP SERVICE, Materials science & engineering. B, Solid-state materials for advanced technology, 35(1-3), 1995, pp. 219-223
One of the main obstacles to starting microsystems is the fact that pa
rticular and hence costly processes are needed. In order to reach affo
rdable prices and a high flexibility, microsystems should whenever pos
sible be conceived such that they can be realized on existing producti
on lines for microelectronics, with additional post-processing for mic
ro-system-specific 2D and 3D structures, e.g. through Multi-Project-Wa
fer services as proposed by the CMP service. Furthermore, this approac
h allows to integrate the microelectronics, needed in most microsystem
s, on the same chip. This paper describes the main micromachining meth
ods, including design theory, implementation and recommendations. It p
resents the results obtained of microelectronics compatible fabricatio
n methods (CMOS bulk and surface micromachining) and microelectromecha
nical systems that have been fabricated using these technologies. It a
lso details the CAD tools support.