COLLECTIVE FABRICATION OF MICROSYSTEMS COMPATIBLE WITH CMOS THROUGH THE CMP SERVICE

Citation
Jm. Karam et al., COLLECTIVE FABRICATION OF MICROSYSTEMS COMPATIBLE WITH CMOS THROUGH THE CMP SERVICE, Materials science & engineering. B, Solid-state materials for advanced technology, 35(1-3), 1995, pp. 219-223
Citations number
5
Categorie Soggetti
Material Science","Physics, Condensed Matter
ISSN journal
09215107
Volume
35
Issue
1-3
Year of publication
1995
Pages
219 - 223
Database
ISI
SICI code
0921-5107(1995)35:1-3<219:CFOMCW>2.0.ZU;2-7
Abstract
One of the main obstacles to starting microsystems is the fact that pa rticular and hence costly processes are needed. In order to reach affo rdable prices and a high flexibility, microsystems should whenever pos sible be conceived such that they can be realized on existing producti on lines for microelectronics, with additional post-processing for mic ro-system-specific 2D and 3D structures, e.g. through Multi-Project-Wa fer services as proposed by the CMP service. Furthermore, this approac h allows to integrate the microelectronics, needed in most microsystem s, on the same chip. This paper describes the main micromachining meth ods, including design theory, implementation and recommendations. It p resents the results obtained of microelectronics compatible fabricatio n methods (CMOS bulk and surface micromachining) and microelectromecha nical systems that have been fabricated using these technologies. It a lso details the CAD tools support.