ELECTRON-MOBILITY IN LOW-TEMPERATURE-GROWN GALLIUM-ARSENIDE

Citation
P. Arifin et al., ELECTRON-MOBILITY IN LOW-TEMPERATURE-GROWN GALLIUM-ARSENIDE, Materials science & engineering. B, Solid-state materials for advanced technology, 35(1-3), 1995, pp. 330-333
Citations number
11
Categorie Soggetti
Material Science","Physics, Condensed Matter
ISSN journal
09215107
Volume
35
Issue
1-3
Year of publication
1995
Pages
330 - 333
Database
ISI
SICI code
0921-5107(1995)35:1-3<330:EILG>2.0.ZU;2-G
Abstract
We investigated theoretically the electron mobility in low temperature grown GaAs (LT GaAs), based on the 'internal Schottky barrier' model, utilizing a Monte Carlo method. We used a novel approach to overcome the problem of inhomogeneity of the internal electric field due to the presence of precipitates. The behaviour of mobility as a function of temperature in LT GaAs for precipitate concentrations in the range 10( 15)-10(17) cm(-3) is presented. This is the first result of mobility c alculation in LT GaAs, based on the Monte Carlo method, reported to da te. The dependence of mobility on the doping concentration is also pre sented.