SPUTTERING OF FULLERENE BY NOBLE-GAS IONS AT HIGH FLUENCES

Citation
D. Fink et al., SPUTTERING OF FULLERENE BY NOBLE-GAS IONS AT HIGH FLUENCES, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 103(4), 1995, pp. 415-422
Citations number
15
Categorie Soggetti
Physics, Nuclear","Nuclear Sciences & Tecnology","Instument & Instrumentation
ISSN journal
0168583X
Volume
103
Issue
4
Year of publication
1995
Pages
415 - 422
Database
ISI
SICI code
0168-583X(1995)103:4<415:SOFBNI>2.0.ZU;2-R
Abstract
Noble gas ions have been implanted into fullerene in the solid state u p to fluences which far exceed the molecular destruction threshold. Th e corresponding depth profile peaks in Rutherford backscattering exper iments move strongly towards the surface signal with increasing fluenc e. This suggests a high degree of target erosion due to collisional sp uttering. One consequence of this process can be an interesting and ba sic effect on the nature of the fullerene destruction products.