SIMULATION OF THE CRYSTALLIZATION OF THIN-FILMS BY RAPID THERMAL-PROCESSING

Citation
R. Pascual et al., SIMULATION OF THE CRYSTALLIZATION OF THIN-FILMS BY RAPID THERMAL-PROCESSING, Journal of applied physics, 79(1), 1996, pp. 493-499
Citations number
23
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
79
Issue
1
Year of publication
1996
Pages
493 - 499
Database
ISI
SICI code
0021-8979(1996)79:1<493:SOTCOT>2.0.ZU;2-8
Abstract
A computer simulation has been performed of phase transformations taki ng place in thin films under various time-temperature regimes. The con ditions used resemble those encountered in the rapid thermal processin g of thin films. The effect of heating rate and final temperature have been studied in detail. It is observed that the two parameters can st rongly influence the grain size and the grain size distribution within the films. The feasibility of using multiple step rapid thermal proce ssing to optimize thin film microstructure is demonstrated. (C) 1996 A merican Institute of Physics.