Mk. Hibbsbrenner et al., PERFORMANCE, UNIFORMITY, AND YIELD OF 850-NM VCSELS DEPOSITED BY MOVPE, IEEE photonics technology letters, 8(1), 1996, pp. 7-9
Vertical-cavity surface-emitting lasers (VCSEL's) emitting near 850 nm
and fabricated with the metal-organic vapor phase epitaxy (MOVPE) epi
taxial growth technique and a planar proton implant process have been
demonstrated with excellent performance, uniformity, and yield across
a 3-in wafer. Four thousand lasers were tested on a three-inch-diamete
r wafer, with a yield of 99.8%. This translates into a yield of 94% fo
r fully functional 34 x 1 arrays. The average threshold current, thres
hold voltage, and dynamic resistance at 10 mA operating current were 3
.07 mA, 1.59 V, and 34 ohms, respectively. Uniformity of better than /-9% in threshold current, +/-1% in threshold voltage, and +/-1.5% in
maximum optical output power across a 34-element array was demonstrate
d.