D. Mcmorrow et al., ELIMINATION OF CHARGE-ENHANCEMENT EFFECTS IN GAAS-FETS WITH A LOW-TEMPERATURE-GROWN GAAS BUFFER LAYER, IEEE transactions on nuclear science, 42(6), 1995, pp. 1837-1843
The use of a low temperature grown GaAs (LT GaAs) buffer layer in GaAs
FETs is shown via computer simulation and experimental measurement to
reduce ion-induced charge collection by two to three orders of magnit
ude. This reduction in collected charge is associated with the efficie
nt reduction of charge-enhancement mechanisms in the FETs. Error rate
calculations indicate that the soft error rate of LT GaAs integrated c
ircuits will be reduced by several orders of magnitude when compared t
o conventional FET-based GaAs ICs.