ELIMINATION OF CHARGE-ENHANCEMENT EFFECTS IN GAAS-FETS WITH A LOW-TEMPERATURE-GROWN GAAS BUFFER LAYER

Citation
D. Mcmorrow et al., ELIMINATION OF CHARGE-ENHANCEMENT EFFECTS IN GAAS-FETS WITH A LOW-TEMPERATURE-GROWN GAAS BUFFER LAYER, IEEE transactions on nuclear science, 42(6), 1995, pp. 1837-1843
Citations number
38
Categorie Soggetti
Nuclear Sciences & Tecnology","Engineering, Eletrical & Electronic
ISSN journal
00189499
Volume
42
Issue
6
Year of publication
1995
Part
1
Pages
1837 - 1843
Database
ISI
SICI code
0018-9499(1995)42:6<1837:EOCEIG>2.0.ZU;2-N
Abstract
The use of a low temperature grown GaAs (LT GaAs) buffer layer in GaAs FETs is shown via computer simulation and experimental measurement to reduce ion-induced charge collection by two to three orders of magnit ude. This reduction in collected charge is associated with the efficie nt reduction of charge-enhancement mechanisms in the FETs. Error rate calculations indicate that the soft error rate of LT GaAs integrated c ircuits will be reduced by several orders of magnitude when compared t o conventional FET-based GaAs ICs.