METALORGANIC CHEMICAL-VAPOR-DEPOSITION OF FERROELECTRIC PBTIO3 THIN FILES ON AMORPHOUS SUBSTRATE

Authors
MA WH CHEN YF YU T SHUN L ZHANG MS MING NB
Citation
Wh. Ma et al., METALORGANIC CHEMICAL-VAPOR-DEPOSITION OF FERROELECTRIC PBTIO3 THIN FILES ON AMORPHOUS SUBSTRATE, Ferroelectrics. Letters section, 20(1-2), 1995, pp. 1-9
Citations number
14
Categorie Soggetti
Physics, Condensed Matter
Journal title
Ferroelectrics. Letters section → ACNP
ISSN journal
07315171
Volume
20
Issue
1-2
Year of publication
1995
Pages
1 - 9
Database
ISI
SICI code
0731-5171(1995)20:1-2<1:MCOFPT>2.0.ZU;2-Z
Abstract
PbTiO3 thin films have been grown on amorphous glass substrate by meta lorganic chemical vapor deposition. The as-deposited films were invest igated using x-ray diffraction and scanning electron microscopy techni ques. PbTiO3 thin films fabricated were polycrystalline highly c-axis- oriented textures. The films were dense-packed and showed uniformly di stributed fine grain size. Growth mechanism and domain structure of th e ferroelectric thin films on amorphous substrate were also studied.