SOFT-X-RAY IMAGE STORAGE IN POLY (METHYL-METHACRYLATE)

Authors
SHINOZAKI DM CHENG PC
Citation
Dm. Shinozaki et Pc. Cheng, SOFT-X-RAY IMAGE STORAGE IN POLY (METHYL-METHACRYLATE), Journal of Materials Science, 31(1), 1996, pp. 192-198
Citations number
15
Categorie Soggetti
Material Science
Journal title
Journal of Materials Science → ACNP
ISSN journal
00222461
Volume
31
Issue
1
Year of publication
1996
Pages
192 - 198
Database
ISI
SICI code
0022-2461(1996)31:1<192:SISIP(>2.0.ZU;2-5
Abstract
Images stored in resist for soft X-ray lithography or microradiography were found to show a background noise which limits the resolution. Th is is due to the statistically variable spatial distribution of the ph otons incident on the resist surface. An estimate of the fundamental n oise-limited resolution has been made from the experimental measuremen t of photon flux incident on the surface and the accurate development rate curves. Monochromatic radiation from a synchrotron source was use d.