In Auger depth profiling in combination with ion sputtering, use of an
insular sample has improved the depth resolution and has enabled pinp
oint analysis without extending measurement time. bn island capped wit
h an erosion-resistant film remains on the substrate after chemical et
ching. When the island is prepared to be smaller than the area subject
ed to ion irradiation, no crater or its sidewall appears during depth
profiling. It is demonstrated that in the determination of depth resol
ution, surface roughening owing to sputter deposition from the sidewal
l of a crater plays a key role, in addition to the interference by sig
nals from a sidewall.