THERMAL-DECOMPOSITION OF DISSOLUTION INHIBITOR IN CHEMICALLY AMPLIFIED RESIST DURING PREBAKE PROCESS

The equation which represents the decomposition mechanism for two diss olution inhibitors in a chemically amplified positive resist consistin g of polyvinylphenol protected with p-t-butoxycarbonylmethyl (BCM-PVP) and p-t-butoxycarbonyl (BOC-PVP) groups was investigated by isotherma l thermogravimetry (TG) analysis. The reaction orders of these polymer s were different and this difference was caused by the difference in t he thermal deprotection reaction of tile protecting group. It was show n that the decomposition of BCM-PVP is promoted as decomposition proce eds, which is expressed by the equation. This result indicates that, w hen BCM-PVP is used as an inhibitor in chemically amplified resists, i t is important to determine the baking temperature and duration in ord er to prevent its decomposition.