DETERMINATION OF THE OVERLAYER SUBSTRATE REGISTRY IN NI(1ML)/PT(111) BY ANGLE-SCANNED PHOTOELECTRON DIFFRACTION/

Authors
SAMBI M PIN E GRANOZZI G
Citation
M. Sambi et al., DETERMINATION OF THE OVERLAYER SUBSTRATE REGISTRY IN NI(1ML)/PT(111) BY ANGLE-SCANNED PHOTOELECTRON DIFFRACTION/, Surface review and letters, 2(6), 1995, pp. 787-793
Citations number
13
Categorie Soggetti
Physics, Condensed Matter","Physics, Atomic, Molecular & Chemical","Material Science
Journal title
Surface review and letters → ACNP
ISSN journal
0218625X
Volume
2
Issue
6
Year of publication
1995
Pages
787 - 793
Database
ISI
SICI code
0218-625X(1995)2:6<787:DOTOSR>2.0.ZU;2-Y
Abstract
The site (fcc or hcp) occupied by the atoms of a Ni ML deposited on Pt (111) is determined in this paper using angle-scanned photoelectron di ffraction (PD). A full 2 pi MgKalpha-excited Ni-2p(3/2) PD pattern fro m 1-ML Ni deposited on Pt(111) is compared to single scattering cluste r-spherical wave (SSC-SW) simulations and the agreement between experi mental and theoretical data is quantified by R-factor analysis. From t he present investigation it turns out that Ni atoms occupy hcp sites. In addition, the Ni-Pt distance has been estimated to be 2.5 +/- 0.1 A ngstrom.