Va. Danilov et al., MEASUREMENT OF LINEAR DIMENSIONS OF SUBMICRON STRUCTURES WITH A SCANNING ELECTRON-MICROSCOPE, Measurement techniques, 38(4), 1995, pp. 398-402
A scanning electron microscope, operating in conditions of secondary s
low-electron collection, was used to measure the dimensions of raised
rectangular structures in the form of 90-500 nm slit-like groves in si
licon. The average measurement error was 0.5-1%.