COARSENING MECHANISMS IN A METAL-FILM - FROM CLUSTER DIFFUSION TO VACANCY RIPENING

Citation
Jm. Wen et al., COARSENING MECHANISMS IN A METAL-FILM - FROM CLUSTER DIFFUSION TO VACANCY RIPENING, Physical review letters, 76(4), 1996, pp. 652-655
Citations number
22
Categorie Soggetti
Physics
Journal title
ISSN journal
00319007
Volume
76
Issue
4
Year of publication
1996
Pages
652 - 655
Database
ISI
SICI code
0031-9007(1996)76:4<652:CMIAM->2.0.ZU;2-U
Abstract
Coarsening of Ag films on Ag(100) at room temperature occurs primarily via diffusion-mediated coalescence of two-dimensional adatom clusters , rather than by Ostwald ripening, up to a coverage of 0.65 monolayer. Above 0.8 monolayer, vacancy clusters coarsen primarily via Ostwald r ipening, due to their much lower diffusivity. An asymmetric transition region separates these two regimes, characterized by a near-percolati ng structure which undergoes self-similar coarsening.