F. Cuevas et al., THE INFLUENCE OF TUNGSTEN SUBSTRATES ON HYDROGEN ABSORPTION BY IODIDETITANIUM FILMS, Journal of alloys and compounds, 231(1-2), 1995, pp. 798-803
Iodide titanium films have been grown on tungsten substrates by means
of a TiI4 flow system. It was found that tungsten diffusion takes plac
e during the titanium film deposition. Tungsten concentrations as high
as 14 at.% have been recorded at 1350 degrees C deposition temperatur
e. On cooling the films to room temperature, titanium remains in the b
eta phase to an extent that depends on the film deposition time. The f
ilms were hydrogenated at 500 degrees C and a large hysteresis effect
was observed in the P-X diagram. This hysteresis effect is explained b
y considering the influence of the tungsten diffusion into the films.