REFRACTIVE-INDEX CHANGE IN AL-ION-IMPLANTED SILICA GLASS()

Citation
K. Fukumi et al., REFRACTIVE-INDEX CHANGE IN AL-ION-IMPLANTED SILICA GLASS(), Journal of applied physics, 79(2), 1996, pp. 1060-1064
Citations number
19
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
79
Issue
2
Year of publication
1996
Pages
1060 - 1064
Database
ISI
SICI code
0021-8979(1996)79:2<1060:RCIASG>2.0.ZU;2-R
Abstract
Al+ ions have been implanted in silica glass at an acceleration energy of 200 eV and doses ranging from 1 x 10(13) to 1 x 10(17) ions cm(-2) . Infrared reflection spectra and ultraviolet, visible, and near-infra red absorption spectra have been measured. It was found that refractiv e index of silica glass increased by 6%-10% after implantation of 1 x 10(17) Al+ ions cm(-2). It was deduced that this refractive index chan ge is caused by the formation of Si-Si homobonds, but not by the decre ase in Si-O-Si bond angle which leads to compaction. (C) 1996 American Institute of Physics.