DETERMINATION OF THE ABSOLUTE DENSITY OF FE3-BLODGETT-FILMS( AND NI2+IONS IN LANGMUIR)

By means of the Langmuir-Blodgett (LB) technique, mono- and multilayer s of Ni2+ and Fe3+ containing fatty acid salts are transferred onto si licon wafers. After thermal treatment, oxidic layers can be produced. The absolute amounts of Fe3+ and Ni2+ ions per monolayer of LB film we re measured and calculated by three different methods. In the case of nickel, the amount expected from theory and preparation conditions was obtained experimentally. In contrast, about twice the number of Fe3ions as expected is transferred. An explanation can be given by the pr esence of hydroxide groups bound to iron. The mean film thickness of t he oxidic layers after thermal treatment was estimated where the thick nesses were found to be <1 nm.