COMPUTER MODELING OF ELECTROCHEMICAL GROWTH WITH CONVECTION AND MIGRATION IN A RECTANGULAR CELL

Citation
Wg. Huang et Db. Hibbert, COMPUTER MODELING OF ELECTROCHEMICAL GROWTH WITH CONVECTION AND MIGRATION IN A RECTANGULAR CELL, Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics, 53(1), 1996, pp. 727-730
Citations number
14
Categorie Soggetti
Physycs, Mathematical","Phsycs, Fluid & Plasmas
ISSN journal
1063651X
Volume
53
Issue
1
Year of publication
1996
Part
B
Pages
727 - 730
Database
ISI
SICI code
1063-651X(1996)53:1<727:CMOEGW>2.0.ZU;2-A
Abstract
We model the growth of electrodeposits with diffusion, convection, and migration in an electric field in a rectangular cell. From differenti al equations, we derive the expressions of growth probability, which p redict that the direction and speed of convection and the electric fie ld govern the pattern formation of electrochemical growth. These theor etical predictions are demonstrated by computer simulations. Different patterns, diffusion-limited aggregation, dendritic, dense, needle, an d treelike, are governed by two parameters: the convection velocity in the direction parallel to the electrodes, and the flow (convection pl us migration in an electric field) perpendicular to the electrodes.