MIXED FILMS OF TIO2-SIO2 DEPOSITED BY DOUBLE ELECTRON-BEAM COEVAPORATION

We used double electron-beam coevaporation to fabricate TiO2-SiO2 mixe d films. The deposition process included oxygen partial pressure, subs trate temperature, and deposition rate, all of which were real-time co mputer controlled. The optical properties of the mixed films varied fr om pure SiO2 to pure TiO2 as the composition of the films varied accor dingly. X-ray diffraction showed that the mixed films all have amorpho us structure with a SiO2 content of as low as 11%. Atomic force micros copy showed that the mixed film has a smoother surface than pure TiO2 film because of its amorphous structure. Linear and Bruggeman's effect ive medium approximation models fit the experimental data better than other models.