DEPTH PROFILING OF IRON IMPURITIES ON GAAS-SURFACES USING TOTAL-REFLECTION X-RAY-FLUORESCENCE

Authors
FAN QM LIU YW WEI CL
Citation
Qm. Fan et al., DEPTH PROFILING OF IRON IMPURITIES ON GAAS-SURFACES USING TOTAL-REFLECTION X-RAY-FLUORESCENCE, Fresenius' journal of analytical chemistry, 354(2), 1996, pp. 193-194
Citations number
6
Categorie Soggetti
Chemistry Analytical
Journal title
Fresenius' journal of analytical chemistry → ACNP
ISSN journal
09370633
Volume
354
Issue
2
Year of publication
1996
Pages
193 - 194
Database
ISI
SICI code
0937-0633(1996)354:2<193:DPOIIO>2.0.ZU;2-Q
Abstract
Depth profiling of iron impurities on GaAs surfaces is performed by me ans of total reflection X-ray fluorescence. A numerical processing pro cedure presented previously is used for the evaluation of the experime ntal data. A detection limit of 10(11) atoms Fe/cm(2) on GaAs surfaces has been achieved.