The electrical conduction of free-standing porous silicon layers, obta
ined from n(+) silicon with various anodization currents and illuminat
ion conditions, has been investigated in vacuum as a function of the t
emperature in the interval 300-210 K. The two-contact I-V characterist
ic is determined by the metal/porous silicon rectifying interface, whe
reas, by using the four-contact technique, a linear dependence of the
current vs voltage was found. The resistance of free-standing samples
showed a thermally activated behavior, with activation energies rangin
g from 0.1 to 0.44 eV. It was found that the activation energy decreas
ed if the light intensity during the anodization was reduced. Variatio
ns of activation energy were also observed if the anodization current
was changed but, in this case, it was not possible to find any correla
tion over the parameter range investigated. (C) 1996 American Institut
e of Physics.