Rk. Thareja Rk",abhilasha,"dwivedi, OPTICAL-EMISSION SPECTROSCOPY OF LASER-PRODUCED CARBON PLASMA AT MODERATE AND LOW IRRADIANCE IN AN AMBIENT ATMOSPHERE, Laser and particle beams, 13(4), 1995, pp. 481-492
The plasma produced during pulsed-laser deposition of thin carbon film
s is studied in the presence of ambient gases (Air, He, Ar) at low and
moderate irradiances of Nd:YAG laser. The presence of ambient gas sho
ws a pronounced effect on the dynamics of the plasma plume. At moderat
e intensity, we report an appearance of a peculiar double-peak structu
re in the temporal profile of the C II transition in laser-produced ca
rbon plasma as it expands into a background gas. We believe that the s
tructure originates mainly due to stratification of the plasma into fa
st and slow ion components at the interface where Rayleigh-Taylor inst
ability occurs. Thin carbon films deposited on silicon in the presence
of argon gas have shown the characteristic features of diamond-like c
arbon in X-ray diffraction and Raman Spectroscopy. The X-ray diffracti
on pattern of carbon film deposited at 1 torr of argon gas pressure sh
ows the dominance of (111), (220), (311), and (400) crystalline plane
of cubic diamond.