SI CORE-LEVEL EXCITATION OF HEXAMETHYLDISILANE STUDIED BY SYNCHROTRON-RADIATION AND MULTIPLE-SCATTERING X-ALPHA CALCULATION

Citation
Jz. Xiong et al., SI CORE-LEVEL EXCITATION OF HEXAMETHYLDISILANE STUDIED BY SYNCHROTRON-RADIATION AND MULTIPLE-SCATTERING X-ALPHA CALCULATION, Chemical physics, 203(1), 1996, pp. 81-92
Citations number
41
Categorie Soggetti
Physics, Atomic, Molecular & Chemical
Journal title
ISSN journal
03010104
Volume
203
Issue
1
Year of publication
1996
Pages
81 - 92
Database
ISI
SICI code
0301-0104(1996)203:1<81:SCEOHS>2.0.ZU;2-S
Abstract
The Si1s, Si2s and Si2p core-level photoabsorption spectra of hexameth yldisilane have been recorded by synchrotron radiation and calculated by the multiple-scattering (MS) X alpha method. The results of the cal culation are in semiquantitative agreement with the experimental spect ra. The relative intensity of corresponding transitions at the (Is, 2s ) or (2p) edges differs greatly on account of atomic-like propensity r ules (s --> p, p --> s, d). Comparison of the gas phase and solid stat e Si2p spectra with the MS-X alpha results indicates that many of the features in the Si2p spectrum of hexamethyldisilane correspond to tran sitions to states of mixed valence and Rydberg character.