GROWTH, CHARACTERIZATION AND ELECTRICAL ANISOTROPY IN LAYERED CHALCOGENIDES GATE AND INTE

Authors
Citation
S. Pal et Dn. Bose, GROWTH, CHARACTERIZATION AND ELECTRICAL ANISOTROPY IN LAYERED CHALCOGENIDES GATE AND INTE, Solid state communications, 97(8), 1996, pp. 725-729
Citations number
15
Categorie Soggetti
Physics, Condensed Matter
Journal title
ISSN journal
00381098
Volume
97
Issue
8
Year of publication
1996
Pages
725 - 729
Database
ISI
SICI code
0038-1098(1996)97:8<725:GCAEAI>2.0.ZU;2-D
Abstract
GaTe and InTe are III-VI semiconductors with layered structures which have large anisotropy in electrical properties. Thermopower, resistivi ty and Hall effect have been studied in orthogonal directions in high quality single crystals grown by the Bridgman technique. The hole effe ctive masses parallel and perpendicular to the layer plane were thus d etermined to be 0.46m(0) and 0.995m(0), respectively for GaTe and 0.12 5 m(0) and 0.765 m(0) for InTe. The carrier activation energies and ho le mobilities were also anisotropic. Optical phonon scattering was dom inant for GaTe with mu alpha T--n with n = 1.85-2.05 and 3.3-3.4 respe ctively along and perpendicular to the layer planes. InTe with higher carrier concentrations showed mu alpha T-m, characteristic of ionised impurity scattering with m = +1.43 in both directions. The optical ban d-gaps and anisotropy of the dielectric constants have also been measu red.