NITROGEN INDUCED INCREASE OF GROWTH-RATE IN CHEMICAL-VAPOR-DEPOSITIONOF DIAMOND

Citation
W. Mullersebert et al., NITROGEN INDUCED INCREASE OF GROWTH-RATE IN CHEMICAL-VAPOR-DEPOSITIONOF DIAMOND, Applied physics letters, 68(6), 1996, pp. 759-760
Citations number
5
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
68
Issue
6
Year of publication
1996
Pages
759 - 760
Database
ISI
SICI code
0003-6951(1996)68:6<759:NIIOGI>2.0.ZU;2-S
Abstract
Polycrystalline diamond films have been grown by microwave assisted ch emical vapor deposition from methane/hydrogen gas mixtures. The additi on of small amounts of nitrogen with concentrations below 50 ppm to th e process gas was found to drastically increase the deposition rate de pending on the microwave power. At 4.2 kW microwave power a five times higher growth rate compared to nitrogen-free depositions was achieved . The optical transmission and thermal conductivity have been measured . The incorporation of small amounts of nitrogen does not degrade the infrared transmission of the samples; the thermal conductivity measure d at room temperature decreased only slightly from 20.5 to 18 W/(cm K) . (C) 1996 American Institute of Physics.