PEAK-TO-VALLEY RATIO OF SMALL RESONANT-TUNNELING DIODES WITH VARIOUS BARRIER-THICKNESS ASYMMETRIES

Citation
T. Schmidt et al., PEAK-TO-VALLEY RATIO OF SMALL RESONANT-TUNNELING DIODES WITH VARIOUS BARRIER-THICKNESS ASYMMETRIES, Applied physics letters, 68(6), 1996, pp. 838-840
Citations number
8
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
68
Issue
6
Year of publication
1996
Pages
838 - 840
Database
ISI
SICI code
0003-6951(1996)68:6<838:PROSRD>2.0.ZU;2-S
Abstract
Resonant tunneling through small double-barrier heterostructures is in vestigated in dependence of the charge accumulation in the quantum wel l and the device diameter. The study comprises a series of resonant-tu nneling diodes with four different barrier-thickness ratios and diamet ers between 300 nm and 10 mu m. Special emphasis lies on the peak-to-v alley ratio of the resonant-tunneling current peaks, which drops drast ically with decreasing device diameter for weak electron accumulation, while it is size independent in the strong-charging case. (C) 1996 Am erican Institute of Physics.