Two-dimensional (2-D) MESFET's having sub-half-micron channel widths h
ave been fabricated on double-delta-doped Al0.24Ga0.76As/In0.18Ga0.82A
s/GaAs heterostructures, The 2-D MESFET operates like a normal transis
tor at room temperature but uses very few electrons in the channel (ab
out 500 at peak current and 5 at threshold), Also, the Narrow Channel
Effect (NCE) and Drain-Induced Barrier Lowering (DIBL) (two effects wh
ich limit the minimum power operation in conventional devices) have be
en practically eliminated, The 0.4 micron wide device had an ON/OFF cu
rrent ratio of 10(5), a peak transconductance of 100 mS/mm, a threshol
d voltage of 0.3 V, a saturation voltage of 0.2 V, and a subthreshold
ideality factor of 1.1, The 2-D MESFET DCFL inverter had a switching v
oltage and noise margin of 0.35 V and 0.26 V, respectively, at 0.8 V s
upply, These room temperature results suggest that the 2-D MESFET is a
n excellent candidate for future low power digital electronics applica
tions.