We report two-terminal real-space transfer diode (RSTD) using InAlAs/I
nGaAs heterojunction grown by low-pressure metalorganic chemical vapor
deposition (LP-MOCVD). By virtue of nonalloyed ohmic contacts as well
as a sewer layer which is electrically separated from ohmic electrode
s, a carrier density modulation and a strong negative differential res
istance can be obtained, The peak-to-valley current ratio up to 140 00
0 (1x10(6)) at 300 (77) K are, to our knowledge, among the best for In
AlAs/InGaAs structures, The proposed device also reveals sharp charge
injection and broad valley range.