THE APPLICATION OF THE CATHODIC ARC TO PLASMA-ASSISTED CHEMICAL-VAPOR-DEPOSITION OF CARBON

This article reports on the properties of hydrogenated carbon films de posited using a cathodic are decomposition process with a graphite cat hode used in a plasma assisted chemical vapor deposition mode. In this application of the cathodic are, acetylene is broken down into radica ls to form hydrogenated amorphous carbon films. Some results are also reported using hydrogen gas. The density in terms of plasmon energy or sp(3) fraction of the films has been found to decrease with increasin g acetylene or hydrogen flow rate, approaching the value for glow disc harge deposited polymer-like hydrogenated amorphous carbon. When subst rate bias is used, the hydrogen content is reduced and graphite microc rystals appear, together with cauliflower-like growths. In the range b etween 100 and 500 V, negative substrate bias increases the density of the films. Overall, the hydrogen content decreases with the density o f the films. (C) 1996 American Institute of Physics.