A DIGITAL METHOD OF GAS-LASER ETCHING FOR OXIDE SUPERCONDUCTORS

Using a gas-assisted laser etching system, a digital etching method wa s demonstrated for Bi-Sr-Ca-Cu-O superconducting thin films. The etche d surface was examined using an atomic force microscope. When NF3 was used as the reactive gas, there was a laser fluence region in which th e etching rate was nearly constant. This result suggests tile existenc e of a self-stopping mechanism in the etching process, indicating tile possible development of this method into a precise layer-by-layer etc hing technology for high-T-c superconducting materials.